Manufacture clean hydrogen water with super pure water. Saturated hydrogen concentration under atmospheric temperature/pressure
Achieved less than 1.0mg/L
Supply high purity and constant density hydrogen water on site, as necessary
Safety design does not support high-pressure gas regulation when the generation pressure is lower than 1MPa
Exhaust hydrogen gas degraded catalyzed and the unit is automatically stopped if hydrogen leak is detected by the gas detector
It is possible to setup an agent injection pump for ORP, and pH control
Usage
Silicon wafer production field: Planation washing
Semiconductor production field: Wash incoming wafer, washing before film generation, washing after CMP
LCD manufacturing field: Wash incoming glass substrate, washing before film generation
Harddisk manufacturing field: Wash incoming glass substrate, washing before film generation
Electrolysis hydrogen water generator process
Standard model data
Model Name
Hydrogen water concentration (mg/L)
Flow rate of hydrogen water (L/min.)
Dimension (WxDxH mm)
Weight (kg)
Power capacity (kVA)
PHW-2700-S
> 1
45
500x600x600
120
1.5(1φAC200V)
PHW-3600-S
> 1
60
500x600x800
140
3.0(1φAC200V)
Utility
Power (confirm voltage and frequency)
Pure water (super pure water at more than 17MΩ/cm) Water temperature is lower than 25 degree. Diluted oxygen concentration is lower than 500ppb)
Cooling water (23 degree ±3 degree)
Control air (0.5-0.7MPa)
Heat exhaust duct
Drain line (gravity flow)
Optional
Internal agent tank (for alkali)
Internal agent injection pump (for alkali)
Internal automatic agent dilution unit (for alkali)
Automatic agent concentration adjustment unit (for alkali)
Source water drain
Central control system (for high levels of the central control system is a standard unit)
Type symbol
Electrolysis hydrogen water generator (PHW)
Amount of hydrogen water Example: 10L/min.→600L/hr→60